Two-dimensional MEMS micromirror and preparation method

The invention relates to a two-dimensional MEMS (Micro Electro Mechanical System) micromirror and a preparation method thereof. The two-dimensional MEMS micromirror comprises a first SOI (Silicon On Insulator) wafer; annular movable teeth with a plurality of empty slots and torsion beams which are a...

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Bibliographische Detailangaben
Hauptverfasser: LI YALEI, QIU XUPING, WEN SAISAI, ZHANG YUHUA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a two-dimensional MEMS (Micro Electro Mechanical System) micromirror and a preparation method thereof. The two-dimensional MEMS micromirror comprises a first SOI (Silicon On Insulator) wafer; annular movable teeth with a plurality of empty slots and torsion beams which are arranged in the empty slots and are vertically connected with the movable teeth are etched on the second SOI wafer; the joint of the movable tooth and the torsion beam is a fillet; upper static teeth with a plurality of second isolation grooves are etched on the third SOI wafer; micro gaps are etched in the second SOI wafer and the third SOI wafer; the first SOI wafer, the second S0I wafer and the third S0I wafer are bonded; the thicknesses of the silicon device layers of the first S0I wafer, the second SOI wafer and the third SOI wafer are 60-150 microns; according to the invention, three pieces of S0I bonding are adopted, the upper static teeth etched by the upper S0I are used for offsetting or reducing the self g