Plasma generating device and coating equipment

The invention relates to the technical field of coating, in particular to a plasma generating device and coating equipment. The plasma generating device comprises a plasma generating mechanism and a magnetic confinement assembly. Wherein the plasma generating mechanism is used for generating plasmas...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JIN WEI, HE YUNPENG, DAI XIUHAI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to the technical field of coating, in particular to a plasma generating device and coating equipment. The plasma generating device comprises a plasma generating mechanism and a magnetic confinement assembly. Wherein the plasma generating mechanism is used for generating plasmas, the plasma generating mechanism comprises a shell used for containing the plasmas, the magnetic confinement assembly is arranged on the periphery of the shell in the direction perpendicular to an outlet of the plasmas, and the magnetic confinement assembly adjusts movement of charged particles in the plasmas through a magnetic field. Therefore, energy of plasma acting on the substrate is reduced, substrate damage caused by high temperature is avoided, the film coating effect and substrate quality are guaranteed, and the yield of the substrate is improved. According to the coating equipment, through the plasma generation device, the coating quality of the substrate is improved, and the substrate is prevented from