Aluminum zinc oxide target material with high oxygen vacancy concentration and preparation method thereof

The invention belongs to the technical field of semiconductors, and discloses a preparation method of an aluminum zinc oxide target material with high oxygen vacancy concentration, which comprises the following steps: in a vacuum environment, putting an aluminum zinc oxide precursor and titanium pow...

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Bibliographische Detailangaben
Hauptverfasser:	LUO SISHI, LI KAIJIE, SHAO XUELIANG, GU DESHENG, ZHANG XINGYU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WORKING METALLIC POWDER
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