Diamond-based gallium nitride transistor preparation method and diamond-based gallium nitride transistor
The invention is suitable for the technical field of semiconductor devices, and provides a diamond-based gallium nitride transistor preparation method and a diamond-based gallium nitride transistor, and the method comprises the steps: preparing an electrode field plate region on the upper surface of...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention is suitable for the technical field of semiconductor devices, and provides a diamond-based gallium nitride transistor preparation method and a diamond-based gallium nitride transistor, and the method comprises the steps: preparing an electrode field plate region on the upper surface of a silicon-based gallium nitride wafer; sputtering a first metal layer on the upper surface of the silicon-based gallium nitride wafer and the upper surface of the silicon wafer, and performing pre-bonding; carrying out temporary bonding on the carrier and the silicon wafer; removing a silicon substrate of the silicon-based gallium nitride wafer to obtain a gallium nitride epitaxial layer supported by the silicon wafer, and sputtering a second metal layer or depositing a dielectric layer on the lower surface of the gallium nitride epitaxial layer and the upper surface of the diamond for bonding; removing the carrier, the silicon wafer and the first metal layer to obtain a diamond-based gallium nitride wafer; and pe |
---|