Mask device, manufacturing method of mask device and photoetching equipment

The invention relates to the field of photoetching, and discloses a mask device which comprises a transparent bottom plate with a phase shift area and a full transparent area which are arranged adjacently, the phase shift area is a phase shift unit with shading layers and phase shift layers, the sha...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	QIU RONGFU, TANG SHAOTUO, LIU WEI, ZHAO XIANGHUI, GU HAIYU, WANG SHIMIN, LI WEI, ZHU ZELI, LI JINJUN, HE YUNFU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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