Fluorine-containing resin for immersed photoresist as well as preparation method and application of fluorine-containing resin

The invention relates to the technical field of photoresist, in particular to the field of IPC C07C233, and more particularly relates to fluorine-containing resin for immersed photoresist as well as a preparation method and application of the fluorine-containing resin. The preparation raw materials of the fluorine-containing resin comprise a fluorine-containing monomer, the structure of the fluorine-containing monomer is shown as a formula 1, and R1, R2 and R3 comprise one of independent hydrogen, fluorine, hydroxyl, trifluoromethyl, perfluoroalkane with the carbon number of 1-8 and fluorine-containing alkane with the carbon number of 1-8; r4 comprises perfluoroalkane with the carbon number of 1-8 or partial fluorine-containing alkane; and R5 comprises one of hydrogen or methyl. R1, R2 and R3 in the fluorine-containing monomer structure comprise one of independent hydrogen, fluorine, hydroxyl, trifluoromethyl, perfluoroalkane with the carbon number of 1-8 and fluorine-containing alkane with the carbon number