Compound, method for producing compound, and method for producing surface treatment agent

Compound, method for producing compound, and method for producing surface treatment agent

Provided are a novel compound, a method for producing the same, and a method for producing a surface treatment agent using the novel compound as a starting material. A compound represented by formula (A1) or formula (A2). G1-(CH2) n-M formula (A1) M-(CH2) n-G2-(CH2) n-M formula (A2) wherein each sym...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MATSUURA KEIGO, UNO MAKOTO, KAWAKAMI TAKAFUMI, ANRAKU EIICHIRO
Format: Patent
Sprache:chi ; eng
Schlagworte:
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Beschreibung
Zusammenfassung:Provided are a novel compound, a method for producing the same, and a method for producing a surface treatment agent using the novel compound as a starting material. A compound represented by formula (A1) or formula (A2). G1-(CH2) n-M formula (A1) M-(CH2) n-G2-(CH2) n-M formula (A2) wherein each symbol in the formula is as described in the specification. 提供新型化合物及其制造方法、以及以该新型化合物为原料的表面处理剂的制造方法。下述式(A1)或式(A2)所示的化合物。G1-(CH2)n-M式(A1)M-(CH2)n-G2-(CH2)n-M式(A2)其中，式中的各符号如说明书所述。