Preparation method of nano silicon carbide abrasive
The invention discloses a preparation method of a nano silicon carbide abrasive material, which comprises the following steps: preparing silicon carbide nano particles through carbon thermal reduction by taking biomass carbon as a carbon source, tetraethoxysilane as a silicon source and ferric nitra...
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| creator | ZHANG WENQING KUANG YAWEI TAN WENGUANG ZHOU PANPAN |
| description | The invention discloses a preparation method of a nano silicon carbide abrasive material, which comprises the following steps: preparing silicon carbide nano particles through carbon thermal reduction by taking biomass carbon as a carbon source, tetraethoxysilane as a silicon source and ferric nitrate as a catalyst, pickling the silicon carbide nano particles, and tempering at 1000-1200 DEG C to obtain the nano silicon carbide abrasive material, the biomass carbon is obtained by carrying out high-temperature carbonization on a dry biomass raw material. The prepared nano silicon carbide abrasive material is good in grinding performance, capable of achieving a high polishing rate and suitable for a semiconductor mechanical grinding and polishing process, and the preparation process is low in energy consumption and low in cost.
本发明公开了一种纳米碳化硅磨料的制备方法，包括以生物质碳为碳源，正硅酸乙酯为硅源，硝酸铁为催化剂，通过碳热还原制备出碳化硅纳米颗粒，对所述碳化硅纳米颗粒进行酸洗并在1000～1200℃下回火制得所述纳米碳化硅磨料，所述生物质碳是由干燥的生物质原料经过高温碳化得到。本发明制得的纳米碳化硅磨料磨削性能好，可达到较高的抛光速率，适用于半导体机械研磨抛光工艺，制备过程能耗低，成本 |
| format | Patent |
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本发明公开了一种纳米碳化硅磨料的制备方法，包括以生物质碳为碳源，正硅酸乙酯为硅源，硝酸铁为催化剂，通过碳热还原制备出碳化硅纳米颗粒，对所述碳化硅纳米颗粒进行酸洗并在1000～1200℃下回火制得所述纳米碳化硅磨料，所述生物质碳是由干燥的生物质原料经过高温碳化得到。本发明制得的纳米碳化硅磨料磨削性能好，可达到较高的抛光速率，适用于半导体机械研磨抛光工艺，制备过程能耗低，成本</description><language>chi ; eng</language><subject>ADHESIVES ; CHEMISTRY ; COMPOUNDS THEREOF ; DYES ; INORGANIC CHEMISTRY ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NANOTECHNOLOGY ; NATURAL RESINS ; NON-METALLIC ELEMENTS ; PAINTS ; PERFORMING OPERATIONS ; POLISHES ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231024&DB=EPODOC&CC=CN&NR=116924409A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231024&DB=EPODOC&CC=CN&NR=116924409A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHANG WENQING</creatorcontrib><creatorcontrib>KUANG YAWEI</creatorcontrib><creatorcontrib>TAN WENGUANG</creatorcontrib><creatorcontrib>ZHOU PANPAN</creatorcontrib><title>Preparation method of nano silicon carbide abrasive</title><description>The invention discloses a preparation method of a nano silicon carbide abrasive material, which comprises the following steps: preparing silicon carbide nano particles through carbon thermal reduction by taking biomass carbon as a carbon source, tetraethoxysilane as a silicon source and ferric nitrate as a catalyst, pickling the silicon carbide nano particles, and tempering at 1000-1200 DEG C to obtain the nano silicon carbide abrasive material, the biomass carbon is obtained by carrying out high-temperature carbonization on a dry biomass raw material. The prepared nano silicon carbide abrasive material is good in grinding performance, capable of achieving a high polishing rate and suitable for a semiconductor mechanical grinding and polishing process, and the preparation process is low in energy consumption and low in cost.
本发明公开了一种纳米碳化硅磨料的制备方法，包括以生物质碳为碳源，正硅酸乙酯为硅源，硝酸铁为催化剂，通过碳热还原制备出碳化硅纳米颗粒，对所述碳化硅纳米颗粒进行酸洗并在1000～1200℃下回火制得所述纳米碳化硅磨料，所述生物质碳是由干燥的生物质原料经过高温碳化得到。本发明制得的纳米碳化硅磨料磨削性能好，可达到较高的抛光速率，适用于半导体机械研磨抛光工艺，制备过程能耗低，成本</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>DYES</subject><subject>INORGANIC CHEMISTRY</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NANOTECHNOLOGY</subject><subject>NATURAL RESINS</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHES</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAOKEotSCxKLMnMz1PITS3JyE9RyE9TyEvMy1cozszJTAYKJycWJWWmpCokJhUlFmeWpfIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUknhnP0NDM0sjExMDS0djYtQAAP-3LHE</recordid><startdate>20231024</startdate><enddate>20231024</enddate><creator>ZHANG WENQING</creator><creator>KUANG YAWEI</creator><creator>TAN WENGUANG</creator><creator>ZHOU PANPAN</creator><scope>EVB</scope></search><sort><creationdate>20231024</creationdate><title>Preparation method of nano silicon carbide abrasive</title><author>ZHANG WENQING ; KUANG YAWEI ; TAN WENGUANG ; ZHOU PANPAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN116924409A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>DYES</topic><topic>INORGANIC CHEMISTRY</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NANOTECHNOLOGY</topic><topic>NATURAL RESINS</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHES</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHANG WENQING</creatorcontrib><creatorcontrib>KUANG YAWEI</creatorcontrib><creatorcontrib>TAN WENGUANG</creatorcontrib><creatorcontrib>ZHOU PANPAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHANG WENQING</au><au>KUANG YAWEI</au><au>TAN WENGUANG</au><au>ZHOU PANPAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Preparation method of nano silicon carbide abrasive</title><date>2023-10-24</date><risdate>2023</risdate><abstract>The invention discloses a preparation method of a nano silicon carbide abrasive material, which comprises the following steps: preparing silicon carbide nano particles through carbon thermal reduction by taking biomass carbon as a carbon source, tetraethoxysilane as a silicon source and ferric nitrate as a catalyst, pickling the silicon carbide nano particles, and tempering at 1000-1200 DEG C to obtain the nano silicon carbide abrasive material, the biomass carbon is obtained by carrying out high-temperature carbonization on a dry biomass raw material. The prepared nano silicon carbide abrasive material is good in grinding performance, capable of achieving a high polishing rate and suitable for a semiconductor mechanical grinding and polishing process, and the preparation process is low in energy consumption and low in cost.
本发明公开了一种纳米碳化硅磨料的制备方法，包括以生物质碳为碳源，正硅酸乙酯为硅源，硝酸铁为催化剂，通过碳热还原制备出碳化硅纳米颗粒，对所述碳化硅纳米颗粒进行酸洗并在1000～1200℃下回火制得所述纳米碳化硅磨料，所述生物质碳是由干燥的生物质原料经过高温碳化得到。本发明制得的纳米碳化硅磨料磨削性能好，可达到较高的抛光速率，适用于半导体机械研磨抛光工艺，制备过程能耗低，成本</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMISTRY COMPOUNDS THEREOF DYES INORGANIC CHEMISTRY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NANOTECHNOLOGY NATURAL RESINS NON-METALLIC ELEMENTS PAINTS PERFORMING OPERATIONS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
| title | Preparation method of nano silicon carbide abrasive |
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