Toilet device

A toilet device is provided with a toilet bowl part and a cleaning mechanism for supplying cleaning water for cleaning a toilet bowl at a flow rate of 1.5 [m/s] or more to the toilet bowl part. The cleaning mechanism has a discharge part for discharging the cleaning water to the toilet bowl part, the toilet bowl part has a toilet bowl surface part provided above the water storage surface of the toilet bowl part and below the discharge part, and the toilet device may be configured such that the flow rate [m/s] of the cleaning water in the toilet bowl surface part is 1.5 or more. 一种便器装置，具有便盆部和清洗机构，该清洗机构向便盆部供给流速为1.5[m/s]以上的用于便器清洗的清洗水。清洗机构具有向便盆部排出清洗水的排出部，便盆部具有设置在便盆部的积存水面上方且排出部下方的盆面部，便器装置也可以构成为使在盆面部中的清洗水的流速[m/s]为1.5以上。