Interdigital variable capacitance diode and preparation method thereof
The invention provides an interdigital variable capacitance diode and a preparation method thereof, and the preparation method comprises the steps: preparing a first interdigital P-type ohmic contact electrode in a first preset region on a P-type ohmic contact layer; the P-type ohmic contact layer p...
Gespeichert in:
Hauptverfasser: | , , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention provides an interdigital variable capacitance diode and a preparation method thereof, and the preparation method comprises the steps: preparing a first interdigital P-type ohmic contact electrode in a first preset region on a P-type ohmic contact layer; the P-type ohmic contact layer provided with the first interdigital P-type ohmic contact electrode is etched, so that an included angle is formed between the side wall of an etching table surface obtained after etching and the N-type ohmic contact layer; respectively preparing a second interdigital N-type ohmic contact electrode and a third interdigital N-type ohmic contact electrode in a second preset area and a third preset area on the N-type ohmic contact layer; etching the N-type ohmic contact layer provided with the second interdigital N-type ohmic contact electrode, the third interdigital N-type ohmic contact electrode and the first interdigital P-type ohmic contact electrode until the semi-insulating substrate is exposed; and growing a met |
---|