Free pupil illumination control system of photoetching machine
The invention discloses a free pupil illumination control system of a photoetching machine. The system comprises an operation center, a control center, a micro-mirror array control unit, a micro-mirror array angular position monitoring unit and a micro-mirror array, the operation center obtains a ta...
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| creator | TONG CHANGQING LIU QINGQIN CHEN HAORAN |
| description | The invention discloses a free pupil illumination control system of a photoetching machine. The system comprises an operation center, a control center, a micro-mirror array control unit, a micro-mirror array angular position monitoring unit and a micro-mirror array, the operation center obtains a target illumination mode of the photoetching machine through the upper computer, calculates a target angular position and an initial driving voltage of each micro-reflector according to the target illumination mode, and sends the target angular position and the initial driving voltage to the control center; the control center sends the initial driving voltage of each micro-reflector to a micro-reflector array control unit so as to drive each micro-reflector to rotate; the micro-reflector array angular position monitoring unit is used for monitoring the angular position of each micro-reflector and feeding back the monitored actually measured angular position to the control center; and the control center is also used f |
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The system comprises an operation center, a control center, a micro-mirror array control unit, a micro-mirror array angular position monitoring unit and a micro-mirror array, the operation center obtains a target illumination mode of the photoetching machine through the upper computer, calculates a target angular position and an initial driving voltage of each micro-reflector according to the target illumination mode, and sends the target angular position and the initial driving voltage to the control center; the control center sends the initial driving voltage of each micro-reflector to a micro-reflector array control unit so as to drive each micro-reflector to rotate; the micro-reflector array angular position monitoring unit is used for monitoring the angular position of each micro-reflector and feeding back the monitored actually measured angular position to the control center; and the control center is also used f</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231020&DB=EPODOC&CC=CN&NR=116909109A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231020&DB=EPODOC&CC=CN&NR=116909109A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TONG CHANGQING</creatorcontrib><creatorcontrib>LIU QINGQIN</creatorcontrib><creatorcontrib>CHEN HAORAN</creatorcontrib><title>Free pupil illumination control system of photoetching machine</title><description>The invention discloses a free pupil illumination control system of a photoetching machine. 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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Free pupil illumination control system of photoetching machine |
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