Free pupil illumination control system of photoetching machine

The invention discloses a free pupil illumination control system of a photoetching machine. The system comprises an operation center, a control center, a micro-mirror array control unit, a micro-mirror array angular position monitoring unit and a micro-mirror array, the operation center obtains a ta...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TONG CHANGQING, LIU QINGQIN, CHEN HAORAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention discloses a free pupil illumination control system of a photoetching machine. The system comprises an operation center, a control center, a micro-mirror array control unit, a micro-mirror array angular position monitoring unit and a micro-mirror array, the operation center obtains a target illumination mode of the photoetching machine through the upper computer, calculates a target angular position and an initial driving voltage of each micro-reflector according to the target illumination mode, and sends the target angular position and the initial driving voltage to the control center; the control center sends the initial driving voltage of each micro-reflector to a micro-reflector array control unit so as to drive each micro-reflector to rotate; the micro-reflector array angular position monitoring unit is used for monitoring the angular position of each micro-reflector and feeding back the monitored actually measured angular position to the control center; and the control center is also used f