VACUUM PROCESSING APPARATUS AND METHOD FOR MANUFACTURING VACUUM PROCESSING SUBSTRATE

The substrate supported in the substrate holder is carried on the holder carrier (5) in such a way that its extension surface is exposed to an ambient atmosphere along the extension surface of the holder carrier (5). The retainer carrier (5) comprises an axis (A11TR, A11LL) transverse to its extending surface. The substrate on the holder carrier (5) is vacuum-processed in a vacuum processing chamber (15). The chamber (15) communicates with a transfer vacuum chamber (23) via a gate valve (21). A holder carrier (5) with a substrate in a vacuum processing chamber (15) is exchanged by an exchange robot (33) with a holder carrier (5) carrying an unprocessed substrate from a transfer vacuum chamber (23). During the processing in the vacuum processing chamber (15), the holder carrier (5) with the processed substrate and the holder carrier (5) with the unprocessed substrate are exchanged in the transfer vacuum chamber (23) by means of a gate valve (25). The transfer vacuum chamber (23) acts as a load lock. 支撑在衬底保持器中的