Substrate processing method, storage medium, and substrate processing apparatus

A substrate processing method according to one aspect of the present disclosure includes: supplying a developer (L1) to a surface (Wa) of a substrate (W) to form a liquid film of the developer on the surface of the substrate; maintaining a liquid film of a developing solution on the surface of the substrate so as to progress the development at the surface of the substrate; and supplying an adjustment liquid (L2) for suppressing development progress to the peripheral region so as to adjust the degree of development between the peripheral region of the surface of the substrate and an inner region on the inner side of the peripheral region while developing by maintaining the liquid film of the developing solution. 本公开的一个方面所涉及的基板处理方法包括：对基板(W)的表面(Wa)供给显影液(L1)，以在基板的表面形成显影液的液膜；在基板的表面上维持显影液的液膜，以使基板的表面处的显影有进展；以及在通过维持显影液的液膜来使显影有进展的期间，对周缘区域供给用于抑制显影的进展的调整液(L2)，以在基板的表面的周缘区域与周缘区域的内侧的内部区域之间调整显影的程度。