Liquid supply unit and liquid supply method
The invention provides a liquid supply unit and a liquid supply method. The liquid supply unit includes: a nozzle; a liquid supply pipe for supplying the processing liquid to the nozzle; an impurity removal unit installed in the liquid supply pipe to remove impurities in the processing liquid, in wh...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a liquid supply unit and a liquid supply method. The liquid supply unit includes: a nozzle; a liquid supply pipe for supplying the processing liquid to the nozzle; an impurity removal unit installed in the liquid supply pipe to remove impurities in the processing liquid, in which the impurity removal unit includes: a measurement unit for measuring characteristics of the impurities in the processing liquid and forming impurity data; a vibration unit for applying vibration to the processing liquid; a capturing unit configured to adsorb impurities in the processing liquid to which the vibration is applied; and a control unit for controlling the measurement unit and the vibration unit, and operating the vibration unit when the impurity data exceeds the reference data range.
本发明提供一种液体供应单元和液体供应方法。该液体供应单元包括:喷嘴;液体供应管,该液体供应管用于向喷嘴供应处理液;杂质去除单元,该杂质去除单元安装在液体供应管中以去除处理液中的杂质,其中杂质去除单元包括:测量单元,该测量单元用于测量处理液中杂质的特性并形成杂质数据;振动单元,该振动单元用于对处理液施加振动;捕获单元,该捕获单元配置为吸附被施加振动的处理液中的杂质;以及控制单元,该控制单元用于控制测量单元和振动单元,以及当杂质数据超过参考 |
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