Substrate processing apparatus and method

A substrate treatment method includes a mixing step of preparing an ozone treatment fluid containing ozone gas and a substrate treatment step of treating a surface of a substrate with the ozone treatment fluid. In the substrate processing step, light is irradiated to the substrate by a lamp. 一种基板处理方...

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Bibliographische Detailangaben
Hauptverfasser: CHOO YOUNG-HO, KWON OH-JIN, YOU JONG-MIN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A substrate treatment method includes a mixing step of preparing an ozone treatment fluid containing ozone gas and a substrate treatment step of treating a surface of a substrate with the ozone treatment fluid. In the substrate processing step, light is irradiated to the substrate by a lamp. 一种基板处理方法,包括:制备含有臭氧气体的臭氧处理流体的混合步骤和使用臭氧处理流体处理基板表面的基板处理步骤。在基板处理步骤中,通过灯将光照射到基板。