PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACE WALL, SPACE WALL STRUCTURE MANUFACTURED USING SAME, AND DISPLAY DEVICE COMPRISING SAME
The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure manufactured from the photosensitive resin composition for forming a partition wall, and a display device comprising the same, the photosensitive resin composition comprising...
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| creator | LEE JAE-EUL KIM HUN-SIK KWON MIN-JEONG |
| description | The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure manufactured from the photosensitive resin composition for forming a partition wall, and a display device comprising the same, the photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, when the thickness of the cured film is 3 [mu] m to 15 [mu] m, the cured film manufactured from the photosensitive resin composition has a transmittance of 20% or less at a wavelength of 450 nm, a reflectance of 10% or more at wavelengths of 550 nm and 650 nm, and a transmittance of 70% or more at a wavelength of 900 nm.
本发明涉及间隔壁形成用感光性树脂组合物、由上述间隔壁形成用感光性树脂组合物制造的间隔壁结构、以及包含其的显示装置，所述感光性树脂组合物包含：(A)着色剂、(B)碱溶性树脂、(C)光聚合性化合物、(D)光聚合引发剂、以及(E)溶剂，由上述感光性树脂组合物制造的固化膜在固化膜的厚度为3μm至15μm时，在450nm波长下透射率为20％以下、在550nm和650nm波长下反射率为10％以上、且在900nm波长下透射率为70％以上。 |
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本发明涉及间隔壁形成用感光性树脂组合物、由上述间隔壁形成用感光性树脂组合物制造的间隔壁结构、以及包含其的显示装置，所述感光性树脂组合物包含：(A)着色剂、(B)碱溶性树脂、(C)光聚合性化合物、(D)光聚合引发剂、以及(E)溶剂，由上述感光性树脂组合物制造的固化膜在固化膜的厚度为3μm至15μm时，在450nm波长下透射率为20％以下、在550nm和650nm波长下反射率为10％以上、且在900nm波长下透射率为70％以上。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231003&DB=EPODOC&CC=CN&NR=116848465A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231003&DB=EPODOC&CC=CN&NR=116848465A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE JAE-EUL</creatorcontrib><creatorcontrib>KIM HUN-SIK</creatorcontrib><creatorcontrib>KWON MIN-JEONG</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACE WALL, SPACE WALL STRUCTURE MANUFACTURED USING SAME, AND DISPLAY DEVICE COMPRISING SAME</title><description>The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure manufactured from the photosensitive resin composition for forming a partition wall, and a display device comprising the same, the photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, when the thickness of the cured film is 3 [mu] m to 15 [mu] m, the cured film manufactured from the photosensitive resin composition has a transmittance of 20% or less at a wavelength of 450 nm, a reflectance of 10% or more at wavelengths of 550 nm and 650 nm, and a transmittance of 70% or more at a wavelength of 900 nm.
本发明涉及间隔壁形成用感光性树脂组合物、由上述间隔壁形成用感光性树脂组合物制造的间隔壁结构、以及包含其的显示装置，所述感光性树脂组合物包含：(A)着色剂、(B)碱溶性树脂、(C)光聚合性化合物、(D)光聚合引发剂、以及(E)溶剂，由上述感光性树脂组合物制造的固化膜在固化膜的厚度为3μm至15μm时，在450nm波长下透射率为20％以下、在550nm和650nm波长下反射率为10％以上、且在900nm波长下透射率为70％以上。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjbsKwkAURNNYiPoP1z4WwShpL7s3ZiH7YB8RqxBkrUQD8Sf8a00QsbQYZhjmMPPkaSrttSPlhBcNgSUnFDAtjR4braDUdpQU6gDOICM4Yl2nPxmct4H5YAkkqlDilDkENzEoKQVUHLhwpsYTcGrEGx1PrPhulsns0l2HuPr4IlmX5Fm1if29jUPfneMtPlqmsmxf5EW-3-H2n80L4tY-_g</recordid><startdate>20231003</startdate><enddate>20231003</enddate><creator>LEE JAE-EUL</creator><creator>KIM HUN-SIK</creator><creator>KWON MIN-JEONG</creator><scope>EVB</scope></search><sort><creationdate>20231003</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACE WALL, SPACE WALL STRUCTURE MANUFACTURED USING SAME, AND DISPLAY DEVICE COMPRISING SAME</title><author>LEE JAE-EUL ; KIM HUN-SIK ; KWON MIN-JEONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN116848465A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE JAE-EUL</creatorcontrib><creatorcontrib>KIM HUN-SIK</creatorcontrib><creatorcontrib>KWON MIN-JEONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE JAE-EUL</au><au>KIM HUN-SIK</au><au>KWON MIN-JEONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACE WALL, SPACE WALL STRUCTURE MANUFACTURED USING SAME, AND DISPLAY DEVICE COMPRISING SAME</title><date>2023-10-03</date><risdate>2023</risdate><abstract>The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure manufactured from the photosensitive resin composition for forming a partition wall, and a display device comprising the same, the photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, when the thickness of the cured film is 3 [mu] m to 15 [mu] m, the cured film manufactured from the photosensitive resin composition has a transmittance of 20% or less at a wavelength of 450 nm, a reflectance of 10% or more at wavelengths of 550 nm and 650 nm, and a transmittance of 70% or more at a wavelength of 900 nm.
本发明涉及间隔壁形成用感光性树脂组合物、由上述间隔壁形成用感光性树脂组合物制造的间隔壁结构、以及包含其的显示装置，所述感光性树脂组合物包含：(A)着色剂、(B)碱溶性树脂、(C)光聚合性化合物、(D)光聚合引发剂、以及(E)溶剂，由上述感光性树脂组合物制造的固化膜在固化膜的厚度为3μm至15μm时，在450nm波长下透射率为20％以下、在550nm和650nm波长下反射率为10％以上、且在900nm波长下透射率为70％以上。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACE WALL, SPACE WALL STRUCTURE MANUFACTURED USING SAME, AND DISPLAY DEVICE COMPRISING SAME |
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