PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACE WALL, SPACE WALL STRUCTURE MANUFACTURED USING SAME, AND DISPLAY DEVICE COMPRISING SAME

The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure manufactured from the photosensitive resin composition for forming a partition wall, and a display device comprising the same, the photosensitive resin composition comprising...

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Bibliographische Detailangaben
Hauptverfasser: LEE JAE-EUL, KIM HUN-SIK, KWON MIN-JEONG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure manufactured from the photosensitive resin composition for forming a partition wall, and a display device comprising the same, the photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a photopolymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, when the thickness of the cured film is 3 [mu] m to 15 [mu] m, the cured film manufactured from the photosensitive resin composition has a transmittance of 20% or less at a wavelength of 450 nm, a reflectance of 10% or more at wavelengths of 550 nm and 650 nm, and a transmittance of 70% or more at a wavelength of 900 nm. 本发明涉及间隔壁形成用感光性树脂组合物、由上述间隔壁形成用感光性树脂组合物制造的间隔壁结构、以及包含其的显示装置,所述感光性树脂组合物包含:(A)着色剂、(B)碱溶性树脂、(C)光聚合性化合物、(D)光聚合引发剂、以及(E)溶剂,由上述感光性树脂组合物制造的固化膜在固化膜的厚度为3μm至15μm时,在450nm波长下透射率为20%以下、在550nm和650nm波长下反射率为10%以上、且在900nm波长下透射率为70%以上。