Five-axis adjusting device and exposure system

The invention relates to the technical field of chip preparation and the technical field of photoetching, in particular to a five-axis adjusting device and an exposure system. A five-axis adjusting device comprises a height adjusting assembly, and the height adjusting assembly comprises a first bott...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	DU JIANKE, HUANG ZHENG, XUE SHULIANG, LI YUJIE, ZHU LINBING, ZHANG ZHENGANG, ZHANG XIAOFANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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