Five-axis adjusting device and exposure system

The invention relates to the technical field of chip preparation and the technical field of photoetching, in particular to a five-axis adjusting device and an exposure system. A five-axis adjusting device comprises a height adjusting assembly, and the height adjusting assembly comprises a first bottom plate and a first top plate which are oppositely arranged; a sliding column is arranged on the first bottom plate, a sliding column is arranged in the first top plate in a penetrating mode, at least one inclined sliding rail pair is arranged between the first bottom plate and the first top plate, the inclined sliding rail pair comprises an inclined sliding groove and an inclined guide rail matched with the inclined sliding groove, and the inclined guide rail is fixedly connected with the first top plate. Force is applied to the inclined guide rail in the horizontal direction to drive the inclined guide rail to move, so that the first top plate ascends or descends along the central axis of the sliding column. The