Photosensitive element and method for forming resist pattern

A photosensitive element having a support film (A) and a photosensitive resin composition layer (B) in this order, in which the expansion area ratio SdrA2 (%) of the interface on the side of the support film (A) in contact with the photosensitive resin composition layer (B) and the expansion area ra...

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1. Verfasser:	YANAGI SHOTA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	A photosensitive element having a support film (A) and a photosensitive resin composition layer (B) in this order, in which the expansion area ratio SdrA2 (%) of the interface on the side of the support film (A) in contact with the photosensitive resin composition layer (B) and the expansion area ratio SdrA1 (%) of the interface on the opposite side as defined in ISO 25178 satisfy formula (1): SdrA1/SdrA2lt; 0.75 (1). 一种感光性元件，其依次具有支承薄膜(A)、感光性树脂组合物层(B)，ISO 25178中规定的前述支承薄膜(A)的与前述感光性树脂组合物层(B)接触一侧的界面的展开面积比SdrA2(％)和相反侧的界面的展开面积比SdrA1(％)满足式(1)：SdrA1/SdrA2