Active-disturbance-rejection motion control method of photoetching machine workpiece table and related device

The invention discloses an active-disturbance-rejection motion control method for a photoetching machine workpiece table, and relates to the technical field of photoetching machines, and the method comprises the steps: carrying out the iterative processing of the actual displacement error of the pho...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHEN DAPENG, CHEN MINGLIANG, WANG JINGXIAN, PENG LIANGQIANG, ZHANG JUNHUI, GUO XIAOMAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!