Semiconductor process equipment and process chamber thereof

The invention discloses a process chamber of semiconductor process equipment. The process chamber comprises a cavity, a calibration mechanism, and a bearing seat, a bracket and a shielding part which are arranged in the cavity, the calibration mechanism is arranged in the cavity; the shielding part can be switched between a first position and a second position along with the bracket; under the condition that the shielding part is located at the first position, the shielding part and the bearing seat are staggered, and the calibration mechanism can adjust the shielding part to a preset position on the bracket; when the shielding part is located at a preset position on the bracket and the bracket drives the shielding part to move to a second position, the shielding part is located above the bearing seat, and the spacing distance between the central axis of the shielding part and the central axis of the bearing seat is smaller than or equal to a first preset distance. According to the scheme, the problem that th