Semiconductor industrial production wastewater treatment process

The invention discloses a semiconductor industrial production wastewater treatment process, which belongs to the technical field of wastewater treatment, and comprises the following steps: 1, under the nitrogen protection condition, mixing amino-functionalized 4A zeolite and absolute methanol, carrying out ultrasonic dispersion, adding anhydrous sodium sulfate, carrying out heating reflux, adding salicylaldehyde, and carrying out reflux reaction to obtain modified 4A zeolite; soaking the modified 4A zeolite in a calcium chloride solution, taking out and drying; and mixing the modified 4A zeolite and a trisodium citrate solution at room temperature, and drying to obtain the adsorption material. 2, adding caustic soda liquid into the wastewater to adjust the pH value to 8-9; and step 3, adding an adsorption material into the wastewater of which the pH is adjusted, standing and settling for 1.5-2 hours, and carrying out solid-liquid separation. The adsorption material provided by the invention not only has good