Supply method and system for reducing crystallization of CMP (Chemical Mechanical Polishing) machine grinding fluid in supply pipeline and element

A supply method for reducing crystallization of grinding fluid of a CMP (chemical mechanical polishing) machine in a supply pipeline and an element comprises the following steps: when the CMP machine is in an idle state, executing internal circulation, the grinding fluid passes through a first pipel...

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Bibliographische Detailangaben
Hauptverfasser: LIU ZHIGONG, ZHOU ZUYUAN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A supply method for reducing crystallization of grinding fluid of a CMP (chemical mechanical polishing) machine in a supply pipeline and an element comprises the following steps: when the CMP machine is in an idle state, executing internal circulation, the grinding fluid passes through a first pipeline, a valve box, a second pipeline, a hand valve, a third pipeline, a filter, a fourth pipeline, a supply switching module, a sixth pipeline, a flow control module, a seventh pipeline, a ninth pipeline, a valve box and a tenth pipeline and returns to a factory affair central supply system or a local supply system for circulation; when ventilation of the first grinding fluid normally-open valve and the fourth normally-open valve is opened, and ventilation of the third normally-closed valve and the fifth normally-closed valve is cut off; grinding fluid is supplied to a grinding fluid spraying arm in the CMP machine table through a first pipeline, the valve box, a second pipeline, a hand valve, a third pipeline, a fi