SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The invention provides a substrate processing apparatus and a substrate processing method. The uniformity of the temperature of a substrate is improved before the substrate containing a drying liquid is carried into a processing container. The substrate processing apparatus includes a tray, a processing container, a moving portion, a supply portion, a discharge portion, and a cooling portion. The tray is used for horizontally holding the substrate containing the drying liquid from the lower part of the substrate. The processing container accommodates a substrate together with a tray. The moving part moves the tray between a standby position outside the processing container and a processing position inside the processing container. The supply unit supplies a supercritical fluid to the inside of the processing container, the supercritical fluid being replaced with the drying liquid. The discharge unit discharges the supercritical fluid from the inside to the outside of the processing container. The cooling unit