Semiconductor device and manufacturing method thereof

Various embodiments of the present disclosure relate to a semiconductor device and a method of manufacturing the same. Disclosed herein is a technique for improving the performance of a semiconductor device having a trench gate type power MOSFET. Specifically, a method of manufacturing a semiconduct...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OMIZU YUTO, ABIKO YUYA
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!