Focusing ring and design method thereof

The invention provides a focusing ring and a design method thereof, and the method comprises the steps: S1, measuring the thickness of the focusing ring, the etching rate of an inner ring and an outer ring of a wafer, and the overall etching uniformity of a cavity under different radio frequency hours of an etching cavity, the variation trend of the thickness of the focusing ring, the etching rate of the inner and outer rings of the wafer and the overall etching uniformity of the cavity along with the increase of the radio frequency hours of the cavity is obtained; and S2, forming a plurality of heat conduction holes in the back surface of the focusing ring according to the thickness of the focusing ring, the etching rate of the inner and outer rings of the wafer and the variation trend of the overall etching uniformity of the cavity along with the increase of the radio frequency hours of the cavity, which are obtained in the step S1. The design structure of the focusing ring is improved, the heat conduction