Method for producing implant comprising coating of silver particles and implant comprising coating of silver
The present disclosure relates to a method for producing an implant comprising a silver-containing coating, comprising the steps of: providing a metal substrate; at least a plurality of layers having silver particles with a total silver concentration of 2 to 20 [mu] g/cm2 are applied in an electroly...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present disclosure relates to a method for producing an implant comprising a silver-containing coating, comprising the steps of: providing a metal substrate; at least a plurality of layers having silver particles with a total silver concentration of 2 to 20 [mu] g/cm2 are applied in an electrolytic cell by plasma electrolytic oxidation, the layers having silver particles being applied in a single electrolytic cell.
本公开涉及一种用于生产包括含银涂层的植入物的方法,其包括以下步骤:提供金属基材;在电解槽中通过等离子电解氧化施加至少多个层,多个层具有总的银浓度为2至20μg/cm2的银颗粒,其中具有银颗粒的层施加在单个电解槽中。 |
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