Fast uniformity drift correction

Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method may include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method may also include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiation of the portion of the finger assembly. The example method may also include determining, by a processor, a change in shape of the finger assembly based on the received radiation. The example method may also include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method may include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly. 提供用于调整光刻设备中的照射狭缝均匀性的系统、设备和方法。示例方法可包括由辐射源利用辐射来照射指状物组件的一部分。所述示例方法还可以包括由辐射检测器响应于对所述指状物组件的所述部分的所述照射来接收所述辐射的至少一部分。所述示例方