System and method for measuring adsorption capacity of adsorbent at low temperature
The invention belongs to the technical field of low-temperature gas purification devices, and particularly relates to a system and a method for measuring the adsorption capacity of an adsorbent at low temperature. The ultra-pure helium used by the system can enable the pressure in the container to b...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention belongs to the technical field of low-temperature gas purification devices, and particularly relates to a system and a method for measuring the adsorption capacity of an adsorbent at low temperature. The ultra-pure helium used by the system can enable the pressure in the container to be at a higher level, the accuracy of pressure measurement is ensured, meanwhile, the adsorption equilibrium pressure of the adsorbent reaches a lower value, the adsorption quantity of the adsorbent in the adsorption equilibrium pressure range of industrial application is obtained, and a basis is provided for designing a gas impurity separation and purification device; a low-temperature valve is adopted, and pneumatic valves are arranged below the liquid level of low-temperature liquid, so that the measured gas in the closed container A and the closed container B does not have temperature gradient during measurement, the influence of temperature on the performance of an adsorbent is eliminated, and the accuracy of a |
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