System and method for measuring adsorption capacity of adsorbent at low temperature

The invention belongs to the technical field of low-temperature gas purification devices, and particularly relates to a system and a method for measuring the adsorption capacity of an adsorbent at low temperature. The ultra-pure helium used by the system can enable the pressure in the container to b...

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Hauptverfasser: HAO JIAFENG, XIAO HAILIANG, GUO XIUJIE, XIE HUI, LI YINGXIAN, ZHOU ZHIYI, YU YING, WU PENG, GUO WANYONG, ZHAO LIANPENG, LI ANQI, BIAN ZHISHANG, HAI YUE, ZHANG ZHEN, XING CHENGQIAN, LI JINGPENG, WANG TIANYAO, HUANG LEI, ZUO GUANGWEI, LI SHIJUN, CHEN JINGYAO, LIU MINGHAO, DENG QIAN, FAN YADING, WU JUNZHE, YAN AITONG, ZHANG CHI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention belongs to the technical field of low-temperature gas purification devices, and particularly relates to a system and a method for measuring the adsorption capacity of an adsorbent at low temperature. The ultra-pure helium used by the system can enable the pressure in the container to be at a higher level, the accuracy of pressure measurement is ensured, meanwhile, the adsorption equilibrium pressure of the adsorbent reaches a lower value, the adsorption quantity of the adsorbent in the adsorption equilibrium pressure range of industrial application is obtained, and a basis is provided for designing a gas impurity separation and purification device; a low-temperature valve is adopted, and pneumatic valves are arranged below the liquid level of low-temperature liquid, so that the measured gas in the closed container A and the closed container B does not have temperature gradient during measurement, the influence of temperature on the performance of an adsorbent is eliminated, and the accuracy of a