Voltage control method and device for power supply of polycrystalline silicon reduction furnace and computer equipment
The invention relates to a voltage control method and device for a polycrystalline silicon reduction furnace power supply, computer equipment, a storage medium and a computer program product. The method comprises the following steps: determining a corresponding initial current according to the curre...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a voltage control method and device for a polycrystalline silicon reduction furnace power supply, computer equipment, a storage medium and a computer program product. The method comprises the following steps: determining a corresponding initial current according to the current stage of a power supply of the polycrystalline silicon reduction furnace, obtaining measurement data of polycrystalline silicon, calculating a voltage deviation value according to the initial current and the measurement data of the polycrystalline silicon, obtaining an expected voltage according to the voltage deviation value and the measurement data of the polycrystalline silicon, and calculating the voltage of the polycrystalline silicon according to the expected voltage. And obtaining a target voltage according to the working mode of the polycrystalline silicon reduction furnace power supply and the expected voltage, and performing voltage control on the polycrystalline silicon reduction furnace power supply |
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