Coating device for silicon carbide single crystal wafer

The invention relates to the technical field of single crystal wafers, in particular to a silicon carbide single crystal wafer coating device which comprises a barrel, a circulation control assembly is arranged on the outer side of the barrel and communicates with an external gas storage device and an external gas recovery device, and a material preparation assembly and a gas supporting assembly are symmetrically arranged on the inner side wall of the barrel; the whole structure is simple and ingenious, gas in the cylinder can be recycled through the circulation control assembly, the cost in the coating work is reduced, multiple silicon carbide single crystal wafers can be placed one by one at the same height position through the material preparation assembly, the labor intensity of workers can be reduced, and the working efficiency is improved. Direct contact between the silicon carbide wafer and the graphite support can be avoided through the gas supporting assembly, and the coating effect of the silicon ca