Electronic-grade polycrystalline silicon preparation system for zone melting based on wettability regulation and control method
The invention relates to the technical field of zone-melting grade polycrystalline silicon, and particularly discloses a zone-melting electronic grade polycrystalline silicon preparation system based on a wettability regulation and control method, the zone-melting electronic grade polycrystalline si...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the technical field of zone-melting grade polycrystalline silicon, and particularly discloses a zone-melting electronic grade polycrystalline silicon preparation system based on a wettability regulation and control method, the zone-melting electronic grade polycrystalline silicon preparation system comprises a chemical vapor deposition furnace, a bottom plate, ventilation column sections, side wall ventilation columns and a ventilation bottom groove, each ventilation column section is arranged in the chemical vapor deposition furnace, the ventilation column sections are sequentially communicated from bottom to top, the ventilation column section at the bottom penetrates through the bottom plate and the chemical vapor deposition furnace, each side wall ventilation column is fixedly connected with the bottom plate and penetrates through the bottom plate and the chemical vapor deposition furnace, and the ventilation bottom groove is communicated with the ventilation column sections and t |
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