Three-dimensional imaging with enhanced resolution

An imaging system may include an imaging metrology tool having: an illumination source; one or more illumination optics for directing illumination from the illumination source to a sample; a detector; one or more collection optics for imaging the sample onto the detector; and one or more aberration...

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Bibliographische Detailangaben
Hauptverfasser: WANG MARK S, LIU XIUMEI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:An imaging system may include an imaging metrology tool having: an illumination source; one or more illumination optics for directing illumination from the illumination source to a sample; a detector; one or more collection optics for imaging the sample onto the detector; and one or more aberration control components. The one or more aberration control components may provide aberration correction to image the sample onto the detector according to one or more degrees of freedom, where the one or more degrees of freedom include at least defocus of the imaging system, and wherein the one or more aberration control components are integrated with at least one of the one or more illumination optics, the one or more collection optics, or the detector. 一种成像系统可包含成像度量工具,所述成像度量工具具有:照明源;一或多个照明光学器件,其用于将照明从所述照明源引导到样本;检测器;一或多个收集光学器件,其用于使所述样本成像到所述检测器上;及一或多个像差控制组件。所述一或多个像差控制组件可提供像差校正以根据一或多个自由度使所述样本成像到所述检测器上,其中所述一或多个自由度包含所述成像系统的至少散焦,且其中所述一或多个像差控制组件与所述一或多个照明光学器件、所述一或多个收集光学器件或所述检测器中的至少一者集成。