Photonic crystal patterning method

The invention discloses a method for patterning a photonic crystal. The method comprises the following specific steps of: forming a patterned groove structure on the surface of a substrate by adopting a photoetching or impressing mode, and carrying out hydrophilic treatment on a groove; filling photonic crystal emulsion into the groove structure and drying; redundant photonic crystal residues outside the groove structure are removed; and adding a protective layer on the surface. According to the photonic crystal pattern obtained through the preparation method, fine patterning manufacturing of 10 microns or below can be achieved, and meanwhile, the groove constructed through the method can meet the requirement for enhancing the physical strength of the photonic crystal at the same time. Through the preparation method provided by the invention, the superposition effect of the structural color of the photonic crystal and the color of the micron-sized grating can be synchronously realized, so that the pattern col