FFU purification system for removing particles and chemical pollutants in microelectronic laboratory
The invention provides an FFU purification system for removing particles and chemical pollutants in a microelectronic laboratory. The FFU purification system comprises a laboratory outer wall assembly; the laboratory inner wall assembly is mounted in the laboratory outer wall assembly; the outdoor a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides an FFU purification system for removing particles and chemical pollutants in a microelectronic laboratory. The FFU purification system comprises a laboratory outer wall assembly; the laboratory inner wall assembly is mounted in the laboratory outer wall assembly; the outdoor air distribution device is mounted on the outer side of the top of the laboratory outer wall assembly; the FFU air supply control system is mounted at the top of the laboratory inner wall assembly; the floor return air control system is mounted at the bottom of the laboratory inner wall assembly; and the central controller sets the return air volume of the corresponding electric air volume adjusting valve below the anti-static floor according to the air speed data collected by the air speed sensor, so that the air speed of the FFU air supply layer and the air speed of the floor return air layer are uniform and consistent. According to the FFU purification system for removing the particles and the chemical pollutants |
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