Sputtering target member, method for producing same, method for producing sputtering film, and magnetron sputtering device

The invention provides a sputtering target member which can perform uniform sputtering and can efficiently use a target base material. The sputtering target member is characterized in that the sputtering target member is provided with a target base material layer, and is further provided with a magn...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KONNO YOSHINORI, SUZUKI TSUGUTO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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