Design method of coaxial capacitive coupling plasma device
The invention discloses a design method of a coaxial capacitive coupling plasma device, which belongs to the technical field of plasma application, and comprises the following steps: designing a metal electrode stem and a metal electrode cavity which are coaxial and insulated from each other in a co...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a design method of a coaxial capacitive coupling plasma device, which belongs to the technical field of plasma application, and comprises the following steps: designing a metal electrode stem and a metal electrode cavity which are coaxial and insulated from each other in a coaxial capacitive coupling plasma cavity; a plurality of powder feeding ports are designed in the top of the metal electrode cavity and distributed in the position, close to the one-third radius of the center, of the top of the metal electrode cavity in a circular array mode. The powder feeding ports are distributed in the position, close to the one-third radius of the center, of the top of the metal electrode cavity in the circular array mode, so that generated plasmas are annular and distributed close to the metal electrode rod, and distribution of the plasmas is improved; the situation of electron density concentration possibly occurring on the wall of the plasma container during the reaction of the inductively c |
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