Plasma cleaning module and plasma cleaning method

The invention relates to the field of plasma etching, and discloses a plasma cleaning module and a plasma cleaning method.The plasma cleaning module comprises two gas exhaust assemblies and at least two electrode plates, the multiple electrode plates are sequentially arranged at intervals in one direction, and a gap is formed between every two adjacent electrode plates; the two gas exhaust assemblies are used for oppositely spraying to-be-ionized gas into the gap, the two adjacent electrode plates generate an alternating electric field when powered on, a magnetic field intersecting with the alternating electric field is arranged in the gap, and under the combined action of the alternating electric field and the magnetic field, reciprocating motion of electrons is changed into spiral rotation motion, so that the stroke of the electrons is increased, and the ionization effect is improved. Therefore, the density of the active particles is increased, the power of diffusion of the active particles towards the deep