Substrate processing apparatus

The invention relates to a substrate processing apparatus. The substrate processing apparatus includes a baking chamber, a chamber door that opens and closes an opening of the baking chamber, a first support plate in the baking chamber, a first partition wall that partitions a space provided on the first support plate into first heat treatment spaces spaced apart from each other in a first horizontal direction and extends in a second horizontal direction and a vertical direction, a first heat treatment module disposed in the first heat treatment space, a first exhaust conduit extending across the first heat treatment space in a first horizontal direction, a first sealing bracket coupled to the first exhaust conduit, a first horizontal encapsulation configured to seal a gap between the first sealing bracket and the chamber door, and a second horizontal encapsulation configured to seal a gap between the first horizontal encapsulation and the chamber door. And a first vertical encapsulation portion configured to