Thermal spray material, thermal spray film, method for forming thermal spray film, and member for plasma etching device

Provided is a thermal spray coating film which has excellent plasma erosion resistance, is capable of protecting a member of a plasma etching device from plasma erosion over a long period of time, and contributes to stable production of equipment and long service life of the member. A thermal spray...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MASUDA TAKAYA, TAGUCHI KENSUKE, MIZUNO HIROAKI, SHIOJIRI YASUHIRO, SUIDZU TATSUO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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