Thermal spray material, thermal spray film, method for forming thermal spray film, and member for plasma etching device

Provided is a thermal spray coating film which has excellent plasma erosion resistance, is capable of protecting a member of a plasma etching device from plasma erosion over a long period of time, and contributes to stable production of equipment and long service life of the member. A thermal spray...

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Bibliographische Detailangaben
Hauptverfasser: MASUDA TAKAYA, TAGUCHI KENSUKE, MIZUNO HIROAKI, SHIOJIRI YASUHIRO, SUIDZU TATSUO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Provided is a thermal spray coating film which has excellent plasma erosion resistance, is capable of protecting a member of a plasma etching device from plasma erosion over a long period of time, and contributes to stable production of equipment and long service life of the member. A thermal spray material according to one embodiment of the present invention is formed from a compound containing a rare earth fluoride in a proportion of 40 mol% to 80 mol%, magnesium fluoride in a proportion of 10 mol% to 40 mol%, and calcium fluoride in a proportion of 0 mol% to 40 mol%. 提供一种耐等离子体侵蚀性优异、能够长期保护等离子体蚀刻装置的构件不受等离子体侵蚀的影响、有助于设备的稳定生产、构件的长寿命化的喷镀覆膜。作为本发明的一个方式的喷镀材料由复合化物形成,所述复合化物以40mol%以上且80mol%以下的比例包含稀土氟化物,以10mol%以上且40mol%以下的比例包含氟化镁,以0mol%以上且40mol%以下的比例包含氟化钙。