Automatic flow control method and system for preparation of oxalic acid ITO etching liquid

The invention relates to the technical field of etching liquid preparation, and discloses an automatic flow control method and system for oxalic acid ITO etching liquid preparation, and the method comprises the steps: calculating the solution preparation demand quantity according to the ITO etching...

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Hauptverfasser: LIN JINHUA, LAI TING'EN, WU QUANGUI, QIU GUILONG, LUO SHUANG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to the technical field of etching liquid preparation, and discloses an automatic flow control method and system for oxalic acid ITO etching liquid preparation, and the method comprises the steps: calculating the solution preparation demand quantity according to the ITO etching liquid demand quantity, discharging ammonia water into additive ultrapure water, and uniformly mixing the ammonia water with the additive ultrapure water to obtain an ammonia water diluent; calculating a target flow rate of the organic acid according to the temperature early warning value and the demand quantity of the organic acid, discharging the organic acid into the ammonia water diluent by utilizing a discharge regulating valve, the target flow rate of the organic acid and the demand quantity of the organic acid, uniformly stirring to obtain an etching solution additive, discharging ultrapure water into an etching solution stirring tank to obtain etching solution ultrapure water, and feeding the etching soluti