Integrally-formed crystal collagen ultrathin upper and lower face masks

The invention discloses and provides a crystal collagen ultrathin upper and lower face mask which is integrally formed, the crystal collagen ultrathin upper and lower face mask comprises a first mask and a second mask which are connected together, a cavity is formed between the first mask and the se...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LI LONGFANG, TAN YU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses and provides a crystal collagen ultrathin upper and lower face mask which is integrally formed, the crystal collagen ultrathin upper and lower face mask comprises a first mask and a second mask which are connected together, a cavity is formed between the first mask and the second mask, a third mask is arranged between the first mask and the second mask, and the first mask and the second mask are integrally formed. According to the mask, the third mask is divided into the upper face mask and the lower face mask, so that the mask can better adapt to different areas of the face, the mask can better take care of the skin requirements of the upper half part and the lower half part through the design of the upper face and the lower face, and therefore the more accurate nursing effect is provided; the first facial mask and the second facial mask are connected into a whole, which means that the first facial mask and the second facial mask are connected together or are not divided, so that the