Skin cleansing composition
Disclosed is an anionic surfactant comprising an anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or mixtures thereof; polypropylene glycol; and a glycol; wherein the weight ratio of diol to anionic surfactant is at least 1: 5. 本发明公开了包含选自烷基硫酸盐、烷基醚硫酸盐或其混合物的阴离子表面活性剂;聚丙二醇;和二醇的皮肤清洁...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Disclosed is an anionic surfactant comprising an anionic surfactant selected from alkyl sulfates, alkyl ether sulfates, or mixtures thereof; polypropylene glycol; and a glycol; wherein the weight ratio of diol to anionic surfactant is at least 1: 5.
本发明公开了包含选自烷基硫酸盐、烷基醚硫酸盐或其混合物的阴离子表面活性剂;聚丙二醇;和二醇的皮肤清洁组合物;其中二醇与阴离子表面活性剂的重量比为至少1:5。 |
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