Gas tank, control method of gas tank, semiconductor thin film deposition equipment and storage medium

The invention provides a gas tank, a control method of the gas tank, semiconductor thin film deposition equipment and a storage medium. The gas tank is arranged on the semiconductor film deposition equipment and comprises a plurality of gas pipelines, a temperature measuring device, at least one fan, an exhaust valve and a controller. The plurality of gas pipelines are used for transmitting reaction gas and/or carrier gas required by thin film deposition reaction, and at least one of the gas pipelines is connected in series with a mass flow meter. And the temperature measuring device is used for collecting the actually measured temperature of the mass flow meter. And the at least one fan is used for discharging gas in the gas tank out of the gas tank. And the exhaust valve is arranged at an exhaust port of the gas tank. The controller is configured to obtain the actually measured temperature of the mass flow meter; and according to the actually measured temperature, the rotating speed of the fan and/or the op