Semiconductor chip cleaning agent and preparation method thereof
The invention discloses a semiconductor chip cleaning agent and a preparation method thereof, and relates to the technical field of semiconductors, the semiconductor chip cleaning agent comprises the following raw materials by mass: 3-6% of a sulfonic acid type fluorine-containing surfactant, 6-10%...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a semiconductor chip cleaning agent and a preparation method thereof, and relates to the technical field of semiconductors, the semiconductor chip cleaning agent comprises the following raw materials by mass: 3-6% of a sulfonic acid type fluorine-containing surfactant, 6-10% of a nonionic surfactant, 0.2-1% of a complexing agent, 0-3% of ethanol, 3-8% of diethylene glycol monobutyl ether, and the balance deionized water; the preparation method comprises the following steps: adding the sulfonic acid type fluorine-containing surfactant and the nonionic surfactant into the deionized water, stirring, adding the ethanol and the diethylene glycol monobutyl ether, stirring, adding the complexing agent, and stirring. The cleaning agent disclosed by the invention has an excellent cleaning effect and can effectively remove solder paste, soldering paste, soldering flux residues and the like on a semiconductor chip, and few residues are left on the surface of the cleaned chip, so that the phenomen |
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