Full-automatic chlor-alkali device control system
The invention relates to the technical field of chlor-alkali device intelligent control, and discloses a full-automatic chlor-alkali device control system.The full-automatic chlor-alkali device control system comprises an APC layer, an OPC server, a conventional control layer and a chlor-alkali devi...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The invention relates to the technical field of chlor-alkali device intelligent control, and discloses a full-automatic chlor-alkali device control system.The full-automatic chlor-alkali device control system comprises an APC layer, an OPC server, a conventional control layer and a chlor-alkali device.According to the full-automatic chlor-alkali device control system, according to the production characteristics and operation habits of a production device, all systems in the device can be automatically controlled according to the production characteristics and operation habits of the production device; and multi-variable coordination control between the system and the external environment is realized, so that the fluctuation amplitude of key controlled variables is reduced, and long-term, stable, safe, optimal and edge-blocking control of the production process is realized. The full-automatic control system can effectively process multivariable control among related variables of each production unit, comprehen |
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