Blending device suitable for semiconductor high-cleanliness chemical solution

The invention belongs to the technical field of high-purity blending of chemical solutions, and discloses a blending device suitable for a semiconductor high-cleanliness chemical solution, the blending device comprises a base, one side of the upper surface of the base is provided with a regulation a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JIAN SHUICUN, ZHAO LONGSHAN, JIAN JIANZHI, LIN YUZHE
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator JIAN SHUICUN
ZHAO LONGSHAN
JIAN JIANZHI
LIN YUZHE
description The invention belongs to the technical field of high-purity blending of chemical solutions, and discloses a blending device suitable for a semiconductor high-cleanliness chemical solution, the blending device comprises a base, one side of the upper surface of the base is provided with a regulation and control mechanism, and the upper surface of the base is provided with a plurality of groups of support plates. Cleaning liquid in the first feeding pipe and drying gas in the second feeding pipe alternately enter the inner cavity of the annular shell through the guide pipe on the front side, and the relative flowing speed of the cleaning liquid or the drying gas along the inner wall of the suction pipe is increased through the rotating direction, opposite to the suction pipe, of the cleaning liquid or the drying gas on the other side of the inner cavity of the annular shell; therefore, the collision strength between attachments on the inner wall of the suction pipe and the cleaning liquid or dry gas is improved,
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN116474636A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN116474636A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN116474636A3</originalsourceid><addsrcrecordid>eNqNijEOwjAMALMwIOAP5gEdqlZhhgrEAhN7FRy3tWScCie8H5B4ANPpdLd0l4OQRtYRIr0YCaxwDnchGNITjB6MSWPB_LGJx6lCoaDCSmaA07cHAUtSMiddu8UQxGjz48ptT8dbd65oTj3ZHJCUct9d69q3u9Y3ft_887wBIuU24w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Blending device suitable for semiconductor high-cleanliness chemical solution</title><source>esp@cenet</source><creator>JIAN SHUICUN ; ZHAO LONGSHAN ; JIAN JIANZHI ; LIN YUZHE</creator><creatorcontrib>JIAN SHUICUN ; ZHAO LONGSHAN ; JIAN JIANZHI ; LIN YUZHE</creatorcontrib><description>The invention belongs to the technical field of high-purity blending of chemical solutions, and discloses a blending device suitable for a semiconductor high-cleanliness chemical solution, the blending device comprises a base, one side of the upper surface of the base is provided with a regulation and control mechanism, and the upper surface of the base is provided with a plurality of groups of support plates. Cleaning liquid in the first feeding pipe and drying gas in the second feeding pipe alternately enter the inner cavity of the annular shell through the guide pipe on the front side, and the relative flowing speed of the cleaning liquid or the drying gas along the inner wall of the suction pipe is increased through the rotating direction, opposite to the suction pipe, of the cleaning liquid or the drying gas on the other side of the inner cavity of the annular shell; therefore, the collision strength between attachments on the inner wall of the suction pipe and the cleaning liquid or dry gas is improved,</description><language>chi ; eng</language><subject>CLEANING ; CLEANING IN GENERAL ; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230725&amp;DB=EPODOC&amp;CC=CN&amp;NR=116474636A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230725&amp;DB=EPODOC&amp;CC=CN&amp;NR=116474636A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JIAN SHUICUN</creatorcontrib><creatorcontrib>ZHAO LONGSHAN</creatorcontrib><creatorcontrib>JIAN JIANZHI</creatorcontrib><creatorcontrib>LIN YUZHE</creatorcontrib><title>Blending device suitable for semiconductor high-cleanliness chemical solution</title><description>The invention belongs to the technical field of high-purity blending of chemical solutions, and discloses a blending device suitable for a semiconductor high-cleanliness chemical solution, the blending device comprises a base, one side of the upper surface of the base is provided with a regulation and control mechanism, and the upper surface of the base is provided with a plurality of groups of support plates. Cleaning liquid in the first feeding pipe and drying gas in the second feeding pipe alternately enter the inner cavity of the annular shell through the guide pipe on the front side, and the relative flowing speed of the cleaning liquid or the drying gas along the inner wall of the suction pipe is increased through the rotating direction, opposite to the suction pipe, of the cleaning liquid or the drying gas on the other side of the inner cavity of the annular shell; therefore, the collision strength between attachments on the inner wall of the suction pipe and the cleaning liquid or dry gas is improved,</description><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNijEOwjAMALMwIOAP5gEdqlZhhgrEAhN7FRy3tWScCie8H5B4ANPpdLd0l4OQRtYRIr0YCaxwDnchGNITjB6MSWPB_LGJx6lCoaDCSmaA07cHAUtSMiddu8UQxGjz48ptT8dbd65oTj3ZHJCUct9d69q3u9Y3ft_887wBIuU24w</recordid><startdate>20230725</startdate><enddate>20230725</enddate><creator>JIAN SHUICUN</creator><creator>ZHAO LONGSHAN</creator><creator>JIAN JIANZHI</creator><creator>LIN YUZHE</creator><scope>EVB</scope></search><sort><creationdate>20230725</creationdate><title>Blending device suitable for semiconductor high-cleanliness chemical solution</title><author>JIAN SHUICUN ; ZHAO LONGSHAN ; JIAN JIANZHI ; LIN YUZHE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN116474636A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>JIAN SHUICUN</creatorcontrib><creatorcontrib>ZHAO LONGSHAN</creatorcontrib><creatorcontrib>JIAN JIANZHI</creatorcontrib><creatorcontrib>LIN YUZHE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JIAN SHUICUN</au><au>ZHAO LONGSHAN</au><au>JIAN JIANZHI</au><au>LIN YUZHE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Blending device suitable for semiconductor high-cleanliness chemical solution</title><date>2023-07-25</date><risdate>2023</risdate><abstract>The invention belongs to the technical field of high-purity blending of chemical solutions, and discloses a blending device suitable for a semiconductor high-cleanliness chemical solution, the blending device comprises a base, one side of the upper surface of the base is provided with a regulation and control mechanism, and the upper surface of the base is provided with a plurality of groups of support plates. Cleaning liquid in the first feeding pipe and drying gas in the second feeding pipe alternately enter the inner cavity of the annular shell through the guide pipe on the front side, and the relative flowing speed of the cleaning liquid or the drying gas along the inner wall of the suction pipe is increased through the rotating direction, opposite to the suction pipe, of the cleaning liquid or the drying gas on the other side of the inner cavity of the annular shell; therefore, the collision strength between attachments on the inner wall of the suction pipe and the cleaning liquid or dry gas is improved,</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN116474636A
source esp@cenet
subjects CLEANING
CLEANING IN GENERAL
MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
title Blending device suitable for semiconductor high-cleanliness chemical solution
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T04%3A04%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JIAN%20SHUICUN&rft.date=2023-07-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN116474636A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true